Supplemental material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO2 with subsequent polyvinylsilsesquioxane modification

Supplemental Material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO2 with subsequent polyvinylsilsesquioxane modification by Huiyu Yang, Yaling Wang, Keshuai Liu, Xin Liu, Fengxiang Chen and Weilin Xu in Textile Research Journal