Yang, Huiyu Wang, Yaling Liu, Keshuai Liu, Xin Chen, Fengxiang Xu, Weilin Supplemental material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification <p>Supplemental Material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification by Huiyu Yang, Yaling Wang, Keshuai Liu, Xin Liu, Fengxiang Chen and Weilin Xu in Textile Research Journal</p> atomic layer deposition;silk fabrics;TiO2;polyvinylsilsesquioxanes;UV-protective 2018-12-01
    https://sage.figshare.com/articles/journal_contribution/Supplemental_material_for_Facile_fabrication_of_ultraviolet-protective_silk_fabrics_via_atomic_layer_deposition_of_TiO_sub_2_sub_with_subsequent_polyvinylsilsesquioxane_modification/7436288
10.25384/SAGE.7436288.v1