10.25384/SAGE.7436288.v1 Huiyu Yang Huiyu Yang Yaling Wang Yaling Wang Keshuai Liu Keshuai Liu Xin Liu Xin Liu Fengxiang Chen Fengxiang Chen Weilin Xu Weilin Xu Supplemental material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification SAGE Journals 2018 atomic layer deposition silk fabrics TiO2 polyvinylsilsesquioxanes UV-protective 2018-12-01 12:00:00 Journal contribution https://sage.figshare.com/articles/journal_contribution/Supplemental_material_for_Facile_fabrication_of_ultraviolet-protective_silk_fabrics_via_atomic_layer_deposition_of_TiO_sub_2_sub_with_subsequent_polyvinylsilsesquioxane_modification/7436288 <p>Supplemental Material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification by Huiyu Yang, Yaling Wang, Keshuai Liu, Xin Liu, Fengxiang Chen and Weilin Xu in Textile Research Journal</p>