10.25384/SAGE.7436288.v1
Huiyu Yang
Huiyu
Yang
Yaling Wang
Yaling
Wang
Keshuai Liu
Keshuai
Liu
Xin Liu
Xin
Liu
Fengxiang Chen
Fengxiang
Chen
Weilin Xu
Weilin
Xu
Supplemental material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification
SAGE Journals
2018
atomic layer deposition
silk fabrics
TiO2
polyvinylsilsesquioxanes
UV-protective
2018-12-01 12:00:00
Journal contribution
https://sage.figshare.com/articles/journal_contribution/Supplemental_material_for_Facile_fabrication_of_ultraviolet-protective_silk_fabrics_via_atomic_layer_deposition_of_TiO_sub_2_sub_with_subsequent_polyvinylsilsesquioxane_modification/7436288
<p>Supplemental Material for Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO<sub>2</sub> with subsequent polyvinylsilsesquioxane modification by Huiyu Yang, Yaling Wang, Keshuai Liu, Xin Liu, Fengxiang Chen and Weilin Xu in Textile Research Journal</p>